Tom's Hardware on MSN
Intel installs industry's first commercial high-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback